Semiconductor structure, method for fabricating thereof, and method for fabricating semiconductor layout
A semiconductor structure, including a plurality of connection patterns disposed on the substrate, and a merged pattern disposed between adjacent two of the connection patterns, wherein the merged pattern includes a first outer line, a central line and a second outer line sequentially arranged along...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
28.05.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor structure, including a plurality of connection patterns disposed on the substrate, and a merged pattern disposed between adjacent two of the connection patterns, wherein the merged pattern includes a first outer line, a central line and a second outer line sequentially arranged along a first direction and connected with each other, and an end surface of the first outer line, an end surface of the central line and an end surface of the second outer line are misaligned along the first direction. |
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Bibliography: | Application Number: US202217706613 |