Contamination trap

A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes com...

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Bibliographic Details
Main Authors Moors, Katja Cornelia Joanna Clasina, Navarro Paredes, Violeta, Direcks, Daniel Jozef Maria, Feijts, Maurice Wilhelmus Leonardus Hendricus, Westerlaken, Jan Steven Christiaan, Hoeijmakers, Pieter Gerardus Mathijs, Derks, Sander Catharina Reinier, Van Drent, William Peter
Format Patent
LanguageEnglish
Published 14.05.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
X-RAY TECHNIQUE
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Summary:A contamination trap for use in a debris mitigation system of a radiation source, the contamination trap comprising a plurality of vanes configured to trap fuel debris emitted from a plasma formation region of the radiation source; wherein at least one vane or each vane of the plurality of vanes comprises a material comprising a thermal conductivity above 30 W m−1 K−1.
Bibliography:Application Number: US202218070155