Control device and master-slave system
There is provided a control device including a control unit configured to control an operation offset that indicates a difference between a control reference point for a slave unit and a control reference point for a master unit on the basis of operation magnification indicating a ratio of a movemen...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
07.05.2024
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Subjects | |
Online Access | Get full text |
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Summary: | There is provided a control device including a control unit configured to control an operation offset that indicates a difference between a control reference point for a slave unit and a control reference point for a master unit on the basis of operation magnification indicating a ratio of a movement amount of the master unit to a movement amount of the slave unit, in which the control unit controls the operation offset for two pairs of master unit and slave unit according to a change in the operation magnification in a case where a designated position of a first pair of master unit and a slave unit of the two pairs of master units and the slave units is kept constant. |
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Bibliography: | Application Number: US202017593481 |