Imprint apparatus, imprint method, and article manufacturing method

Imprint apparatus performs, on shot regions of substrate, imprint process for transferring pattern of mold to imprint material arranged on the substrate. The apparatus includes detector for detecting first mark of the substrate and second mark of the mold, and controller configured to control positi...

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Bibliographic Details
Main Author Kamei, Kengo
Format Patent
LanguageEnglish
Published 23.04.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Imprint apparatus performs, on shot regions of substrate, imprint process for transferring pattern of mold to imprint material arranged on the substrate. The apparatus includes detector for detecting first mark of the substrate and second mark of the mold, and controller configured to control positioning of the detector based on driving amount, held in a storage, by which the detector is to be driven to fit the first mark and the second mark within specific region of field of view of the detector, and correction value held in the storage and used to correct the driving amount. The controller performs alignment between shot region selected from the shot regions and the mold based on output of the detector, and updates the correction value held in the storage based on the output of the detector.
Bibliography:Application Number: US202217741827