Semiconductor structure and method for forming the same

A semiconductor structure includes a substrate comprising a peripheral region and a memory region defined thereon, a first dielectric layer disposed on the substrate, a second dielectric layer disposed on the first dielectric layer, an opening on the peripheral region of the substrate and having a l...

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Bibliographic Details
Main Authors Tung, Yu-Cheng, Lee, Fu-Che, Liu, An-Chi, Jhan, Yi-Wang, Yan, Yifei, Lin, Gang-Yi
Format Patent
LanguageEnglish
Published 13.02.2024
Subjects
ELECTRICITY
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Summary:A semiconductor structure includes a substrate comprising a peripheral region and a memory region defined thereon, a first dielectric layer disposed on the substrate, a second dielectric layer disposed on the first dielectric layer, an opening on the peripheral region of the substrate and having a lower portion through the first dielectric layer and an upper portion through the second dielectric layer, an interconnecting structure disposed on the second dielectric layer and two sides of the opening, a contact structure disposed in the lower portion of the opening, and a spacer covering a top surface of the contact structure, a sidewall of the second dielectric layer, and a sidewall of the interconnecting structure.
Bibliography:Application Number: US202117378787