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A semiconductor device according to the present disclosure includes a semiconductor layer, a plurality of metal isolation features disposed in the semiconductor layer, a metal grid disposed directly over the plurality of metal isolation features, and a plurality of microlens features disposed over t...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
13.02.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor device according to the present disclosure includes a semiconductor layer, a plurality of metal isolation features disposed in the semiconductor layer, a metal grid disposed directly over the plurality of metal isolation features, and a plurality of microlens features disposed over the metal grid. |
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Bibliography: | Application Number: US202117369567 |