Fabric and method of manufacturing
A moisture exchange fabric is disclosed the fabric comprising: a substrate fabric; a polymer having lower critical solution temperature (LCST) of between 25° C. and 39° C. bonded to the substrate fabric; and a filament sewed into the substrate fabric. Also disclosed is a humidifying apparatus using...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
13.02.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A moisture exchange fabric is disclosed the fabric comprising: a substrate fabric; a polymer having lower critical solution temperature (LCST) of between 25° C. and 39° C. bonded to the substrate fabric; and a filament sewed into the substrate fabric. Also disclosed is a humidifying apparatus using the moisture exchange fabric. |
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Bibliography: | Application Number: US201816763832 |