Compositions for removing nail polish

The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compo...

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Bibliographic Details
Main Authors Henry, Derek James, Guimont, Aline Aude, Lam, Hubert Tunchiao, Li, Chunhua
Format Patent
LanguageEnglish
Published 13.02.2024
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Summary:The invention relates to compositions for removing nail polish comprising at least at least about 10% by weight of at least one polyhydric alcohol compound, at least one low carbon alcohol, at least one high boiling point ester compound, at least one thickening agent, and at least one abrasive compound, as well as to methods of removing nail polish from nails using such compositions.
Bibliography:Application Number: US202117140567