Chain scission photoresists and methods for forming chain scission photoresists

A photoresist is disclosed. The photoresist includes a polymer with one repeating unit and an absorbing unit.

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Bibliographic Details
Main Authors Han, Eungnak, Bristol, Robert, Blackwell, James, Doyle, Lauren, Krysak, Marie
Format Patent
LanguageEnglish
Published 19.12.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A photoresist is disclosed. The photoresist includes a polymer with one repeating unit and an absorbing unit.
Bibliography:Application Number: US201816147131