Semiconductor memory devices

A semiconductor memory device includes a stack structure including a plurality of layers vertically stacked on a substrate. Each of the plurality of layers includes a first dielectric layer, a semiconductor layer, and a second dielectric layer that are sequentially stacked, and a first conductive li...

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Bibliographic Details
Main Authors Kim, Bong-Soo, Kim, Junsoo, Yamada, Satoru, Lee, Kiseok, Lee, Kyupil, Hong, HyeongSun, Han, Sunghee, Kim, Hui-Jung, Hwang, Yoosang
Format Patent
LanguageEnglish
Published 12.12.2023
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Summary:A semiconductor memory device includes a stack structure including a plurality of layers vertically stacked on a substrate. Each of the plurality of layers includes a first dielectric layer, a semiconductor layer, and a second dielectric layer that are sequentially stacked, and a first conductive line in the second dielectric layer and extending in a first direction. The device also includes a second conductive line extending vertically through the stack structure, and a capacitor in the stack structure and spaced apart from the second conductive line. The semiconductor layer includes semiconductor patterns extending in a second direction intersecting the first direction between the first conductive line and the substrate. The second conductive line is between a pair of the semiconductor patterns adjacent to each other in the first direction. An end of each of the semiconductor patterns is electrically connected to a first electrode of the capacitor.
Bibliography:Application Number: US202217748261