Fin-based and bipolar electrostatic discharge devices
The present disclosure relates to semiconductor structures and, more particularly, to electrostatic discharge (ESD) devices and methods of manufacture. The structure (ESD device) includes: a bipolar transistor comprising a collector region, an emitter region and a base region; and a lateral ballasti...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
31.10.2023
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Subjects | |
Online Access | Get full text |
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Summary: | The present disclosure relates to semiconductor structures and, more particularly, to electrostatic discharge (ESD) devices and methods of manufacture. The structure (ESD device) includes: a bipolar transistor comprising a collector region, an emitter region and a base region; and a lateral ballasting resistance comprising semiconductor material adjacent to the collector region. |
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Bibliography: | Application Number: US202117185243 |