Semiconductor device and method for fabricating the same
A method for fabricating semiconductor device includes the steps of first providing a substrate having a first region and a second region, forming a first bottom barrier metal (BBM) layer on the first region and the second region, forming a first work function metal (WFM) layer on the first BBM laye...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
12.09.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A method for fabricating semiconductor device includes the steps of first providing a substrate having a first region and a second region, forming a first bottom barrier metal (BBM) layer on the first region and the second region, forming a first work function metal (WFM) layer on the first BBM layer on the first region and the second region, and then forming a diffusion barrier layer on the first WFM layer. |
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Bibliography: | Application Number: US202217709385 |