Pellicle and pellicle assembly

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle a...

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Main Authors Janssen, Johannes Joseph, Van Den Einden, Wilhelmus Theodorus Anthonius Johannes, Van Der Zande, Willem Joan, Péter, Mária, Janssen, Paul, Voorthuijzen, Willem-Pieter, De Groot, Antonius Franciscus Johannes, Kurganova, Evgenia, Vermeulen, Johannes Petrus Martinus Bernardus, Zdravkov, Aleksandar Nikolov, Patel, Hrishikesh, Meijer, Marcel Peter, Klootwijk, Johan Hendrik, Olsman, Raymond, Meijerink, Wouter Rogier, Van Den Bosch, Gerrit, Van Zwol, Pieter-Jan, Ande, Chaitanya Krishna, Vles, David Ferdinand, Nasalevich, Maxim Aleksandrovich, Giesbers, Adrianus Johannes Maria, Wondergem, Hendrikus Jan, Knapen, Peter Simon Antonius, Notenboom, Arnoud Willem
Format Patent
LanguageEnglish
Published 12.09.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
Bibliography:Application Number: US202117548944