Semiconductor device under bump structure and method therefor

A method of manufacturing a semiconductor device is provided. The method includes depositing a non-conductive layer over a semiconductor die. An opening is formed in the non-conductive layer exposing a portion of a bond pad of the semiconductor die. A cavity is in the non-conductive layer with a por...

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Bibliographic Details
Main Authors Lo, Tsung Nan, Tay, Sharon Huey Lin, Macatangay, Antonio Aguinaldo Marquez
Format Patent
LanguageEnglish
Published 15.08.2023
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Summary:A method of manufacturing a semiconductor device is provided. The method includes depositing a non-conductive layer over a semiconductor die. An opening is formed in the non-conductive layer exposing a portion of a bond pad of the semiconductor die. A cavity is in the non-conductive layer with a portion of the non-conductive layer remaining between a bottom surface of the cavity and a bottom surface of the non-conductive layer. A conductive layer is formed over the non-conductive layer and the portion of the bond pad. The conductive layer is configured to interconnect the bond pad with a conductive layer portion over the cavity.
Bibliography:Application Number: US202117239888