Overlay design for electron beam and scatterometry overlay measurements
Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic structure can be positioned under the gratings of the first periodic structure or can be positioned between the gratings of the first periodic...
Saved in:
Main Authors | , , , , , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
08.08.2023
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Abstract | Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic structure can be positioned under the gratings of the first periodic structure or can be positioned between the gratings of the first periodic structure. These overlay targets can be used in semiconductor manufacturing. |
---|---|
AbstractList | Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic structure can be positioned under the gratings of the first periodic structure or can be positioned between the gratings of the first periodic structure. These overlay targets can be used in semiconductor manufacturing. |
Author | Naot, Ira Eyring, Stefan Ghinovker, Mark Hajaj, Eitan Pohlmann, Ulrich Steely-Tarshish, Inna Feler, Yoel Gutman, Nadav Steely, Chris Yohanan, Raviv |
Author_xml | – fullname: Yohanan, Raviv – fullname: Naot, Ira – fullname: Hajaj, Eitan – fullname: Gutman, Nadav – fullname: Eyring, Stefan – fullname: Steely-Tarshish, Inna – fullname: Feler, Yoel – fullname: Ghinovker, Mark – fullname: Pohlmann, Ulrich – fullname: Steely, Chris |
BookMark | eNqNyzsOwjAQRVEXUPDbw7AApDgp0oP4dBRAHQ3JC0Kyx5FnQMruabIAqtucu3QzSYKFO1-_yIFH6qDvl1CfMiGgtZyEnuBILB1py2bIKcLySGlaIlg_GRFiunbznoNiM3Xltqfj_XDZYUgNdOAWAmseN-_rsigqvy-rf8wP0pQ2dg |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences Physics |
ExternalDocumentID | US11720031B2 |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_US11720031B23 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 12:57:34 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_US11720031B23 |
Notes | Application Number: US202117487725 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230808&DB=EPODOC&CC=US&NR=11720031B2 |
ParticipantIDs | epo_espacenet_US11720031B2 |
PublicationCentury | 2000 |
PublicationDate | 20230808 |
PublicationDateYYYYMMDD | 2023-08-08 |
PublicationDate_xml | – month: 08 year: 2023 text: 20230808 day: 08 |
PublicationDecade | 2020 |
PublicationYear | 2023 |
RelatedCompanies | KLA Corporation |
RelatedCompanies_xml | – name: KLA Corporation |
Score | 3.490737 |
Snippet | Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING |
Title | Overlay design for electron beam and scatterometry overlay measurements |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230808&DB=EPODOC&locale=&CC=US&NR=11720031B2 |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_G_HzTquj8IIL0rbiu6VofirB2dQhbh1tlb2NpMlBoO2xV_O-9hNb6oq8JOZIjl_vlcvcLwA1CfN5jrnwapNygjt0zGON3hiQLF2xtIWSQoYHxpD-K6ePCXrTgta6FUTyhn4ocES0qQXsv1Xm9aYJYgcqtLG7ZCzbl9-HcC_Tqdox42u26ejDwhtMoiHzd9714pk-ePBMdtdzAAzyutySMljz7w-eBrErZ_HYp4QFsT1FaVh5CS2Qa7Pn1z2sa7I6rB28NdlSGZlJgY2WFxRE8RB8yCvdFuEq_IIg7Sf2dDWFilZJVxkmRKOrMPBUolOTVkLSJCRbHcB0O5_7IwLktfxSxjGfNMqwTaGd5Jk6B0G5iUYfbJnMEXpds1nfMFQIJThPWR_d_Bp2_5XT-6zyHfalUlfDmXkC7fHsXl-iES3altPcNuRqLWg |
link.rule.ids | 230,309,786,891,25594,76903 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8MwDLam8Rg3KKAxXkFCvVWsa7uWQ4W0dmXAXmIt2m1qmiCBtHaiBcS_x4laxgWujmIlVmx_dhwH4BIhPutQR1wNmkwzbaujUcquNdEsnNNnAyGDSA2Mxt1BZN7PrXkNXqu3MLJP6KdsjogalaC-F9Jer9ZJLF_WVuZX9AVJ2U0Qur5aRseIp522o_o9tz-d-BNP9Tw3mqnjR1dHRy0OcA_N9YaNIaEMlZ564lXK6rdLCXZhc4rc0mIPajxVoOFVP68psD0qL7wV2JIVmkmOxFIL8324nXyILNwXYbL8giDuJNV3NoTyeEnilJE8ka0zsyVHpiQrpyzXOcH8AC6CfugNNFzb4kcQi2i23oZxCPU0S3kTiNlODNNmlk5tjuGSRbu2HiOQYGZCu-j-j6D1N5_Wf4Pn0BiEo-FieDd-OIYdIWBZ_OacQL14e-en6JALeiYl-Q1iQ45E |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Overlay+design+for+electron+beam+and+scatterometry+overlay+measurements&rft.inventor=Yohanan%2C+Raviv&rft.inventor=Naot%2C+Ira&rft.inventor=Hajaj%2C+Eitan&rft.inventor=Gutman%2C+Nadav&rft.inventor=Eyring%2C+Stefan&rft.inventor=Steely-Tarshish%2C+Inna&rft.inventor=Feler%2C+Yoel&rft.inventor=Ghinovker%2C+Mark&rft.inventor=Pohlmann%2C+Ulrich&rft.inventor=Steely%2C+Chris&rft.date=2023-08-08&rft.externalDBID=B2&rft.externalDocID=US11720031B2 |