Overlay design for electron beam and scatterometry overlay measurements
Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic structure can be positioned under the gratings of the first periodic structure or can be positioned between the gratings of the first periodic...
Saved in:
Main Authors | , , , , , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
08.08.2023
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Combined electron beam overlay and scatterometry overlay targets include first and second periodic structures with gratings. Gratings in the second periodic structure can be positioned under the gratings of the first periodic structure or can be positioned between the gratings of the first periodic structure. These overlay targets can be used in semiconductor manufacturing. |
---|---|
Bibliography: | Application Number: US202117487725 |