Photomask, exposure apparatus, and method of fabricating three-dimensional semiconductor memory device using the same
Disclosed are a photomask, an exposure apparatus, and a method of fabricating a three-dimensional semiconductor memory device using the same. The photomask may include a mask substrate, a first mask pattern on the mask substrate, and an optical path modulation substrate. The optical path modulation...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
30.05.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed are a photomask, an exposure apparatus, and a method of fabricating a three-dimensional semiconductor memory device using the same. The photomask may include a mask substrate, a first mask pattern on the mask substrate, and an optical path modulation substrate. The optical path modulation substrate may include a first region on a portion of the first mask pattern, and a second region on another portion of the first mask pattern. The second region has a thickness that is less than a thickness of the first region. |
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Bibliography: | Application Number: US202117306644 |