Device architectures having engineered stresses
The present disclosure relates to a method that includes depositing a spalling layer onto a surface that includes a substrate, depositing a device comprising a III-V material onto the spalling layer, resulting in the forming of a stack, and dividing the stack substantially at a plane positioned with...
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Main Author | |
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Format | Patent |
Language | English |
Published |
23.05.2023
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Subjects | |
Online Access | Get full text |
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