Device architectures having engineered stresses

The present disclosure relates to a method that includes depositing a spalling layer onto a surface that includes a substrate, depositing a device comprising a III-V material onto the spalling layer, resulting in the forming of a stack, and dividing the stack substantially at a plane positioned with...

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Bibliographic Details
Main Author Steiner, Myles Aaron
Format Patent
LanguageEnglish
Published 23.05.2023
Subjects
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