Integrated circuit structure and method of forming the same

• Main Authors: Sio, Kam-Tou, Chen, Chih-Liang, Tzeng, Jiann-Tyng, Chiu, Yi-Hsun, Young, Charles Chew-Yuen, Zhuang, Hui-Zhong
• Format: Patent
• Language: English
• Published: 16.05.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

An integrated circuit structure includes a first well, a second well, a third well, a first set of implants and a second set of implants. The first well includes a first dopant type, a first portion extending in a first direction and having a first width, and a second portion adjacent to the first p...