Nanometer self-locking bentonite film-forming agent, method for preparing the same, and film-forming drilling fluid

The present application discloses a nanometer self-locking bentonite film-forming agent, a method for preparing the same, and a film-forming drilling fluid.

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Bibliographic Details
Main Authors Ge, Yao, Dong, Wenxin, Pu, Xiaolin, Han, Tao, Chen, Jianjun, Chen, Siyi, Chen, Wei, Cao, Yi, Wang, Hanyi, Jiang, Deyi, Fan, Jinyang, Liu, Wenhao, Sun, Jinsheng, Xiao, Jingwen
Format Patent
LanguageEnglish
Published 02.05.2023
Subjects
ADHESIVES
AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
CHEMISTRY
COMPOSITIONS BASED THEREON
DYES
GENERAL PROCESSES OF COMPOUNDING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
WORKING-UP
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Summary:The present application discloses a nanometer self-locking bentonite film-forming agent, a method for preparing the same, and a film-forming drilling fluid.
Bibliography:Application Number: US202217866046