Solar cell emitter region fabrication with differentiated P-type and N-type architectures and incorporating dotted diffusion
Methods of fabricating solar cell emitter regions with differentiated P-type and N-type architectures and incorporating dotted diffusion, and resulting solar cells, are described. In an example, a solar cell includes a substrate having a light-receiving surface and a back surface. A first polycrysta...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
14.02.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Methods of fabricating solar cell emitter regions with differentiated P-type and N-type architectures and incorporating dotted diffusion, and resulting solar cells, are described. In an example, a solar cell includes a substrate having a light-receiving surface and a back surface. A first polycrystalline silicon emitter region of a first conductivity type is disposed on a first thin dielectric layer disposed on the back surface of the substrate. A second polycrystalline silicon emitter region of a second, different, conductivity type is disposed on a second thin dielectric layer disposed in a plurality of non-continuous trenches in the back surface of the substrate. |
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Bibliography: | Application Number: US202017068748 |