Optimization of semiconductor cell of vertical field effect transistor (VFET)
A vertical field effect transistor (VFET) cell implementing a VFET circuit over a plurality of gate grids includes: a 1st circuit including at least one VFET and provided over at least one gate grid; and a 2nd circuit including at least one VFET and provided over at least one gate grid formed on a l...
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Main Author | |
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Format | Patent |
Language | English |
Published |
14.02.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A vertical field effect transistor (VFET) cell implementing a VFET circuit over a plurality of gate grids includes: a 1st circuit including at least one VFET and provided over at least one gate grid; and a 2nd circuit including at least one VFET and provided over at least one gate grid formed on a left or right side of the 1st circuit, wherein a gate of the VFET of the 1st circuit is configured to share a gate signal or a source/drain signal of the VFET of the 2nd circuit, and the 1st circuit is an (X−1)-contacted poly pitch (CPP) circuit, which is (X−1) CPP wide, converted from an X-CPP circuit which is X CPP wide and performs a same logic function as the (X−1)-CPP circuit, X being an integer greater than 1. |
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Bibliography: | Application Number: US202016941042 |