Plant control method, plant control device, program, and plant

The plant control method includes the following. Calculating a first reference amount to be supplied for an amount of hydrogen to be supplied to a second production device (40). Making a decision on whether or not the amount of remaining hydrogen in a storage device (20) at the beginning of a subjec...

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Bibliographic Details
Main Authors Hoshino, Yuki, Fujimura, Yasushi, Fujimoto, Sho, Kai, Mototaka
Format Patent
LanguageEnglish
Published 14.02.2023
Subjects
APPARATUS THEREFOR
CHEMISTRY
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
METALLURGY
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
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Summary:The plant control method includes the following. Calculating a first reference amount to be supplied for an amount of hydrogen to be supplied to a second production device (40). Making a decision on whether or not the amount of remaining hydrogen in a storage device (20) at the beginning of a subject term falls within a reference range.
Bibliography:Application Number: US202017606043