Isoporous mesoporous asymmetric block copolymer materials with macrovoids and method of making the same
A mesoporous isoporous asymmetric material includes at least one diblock or multiblock copolymer, wherein the material has a transition layer having a thickness of at least 300 nm and a low macrovoid density, and the material has a sub-structure adjacent to said transition layer and said sub-structu...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
07.02.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A mesoporous isoporous asymmetric material includes at least one diblock or multiblock copolymer, wherein the material has a transition layer having a thickness of at least 300 nm and a low macrovoid density, and the material has a sub-structure adjacent to said transition layer and said sub-structure comprises a high macrovoid density. A method for producing mesoporous isoporous asymmetric materials having macrovoids can include: dissolving at least one diblock or multiblock copolymer in a solution, the solution having one or more solvents and one or more nonsolvents, to form a polymer solution; dispensing the polymer solution onto a substrate or mold, or through a die or template; removing at least a portion of solvent and/or nonsolvent from the polymer solution to form a concentrated polymer solution; and exposing the concentrated polymer solution to a nonsolvent causing precipitation of at least a portion of the polymer from the concentrated polymer solution. |
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Bibliography: | Application Number: US201916980021 |