Isoporous mesoporous asymmetric block copolymer materials with macrovoids and method of making the same

A mesoporous isoporous asymmetric material includes at least one diblock or multiblock copolymer, wherein the material has a transition layer having a thickness of at least 300 nm and a low macrovoid density, and the material has a sub-structure adjacent to said transition layer and said sub-structu...

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Bibliographic Details
Main Authors Gu, Yibei, Shethji, Jayraj K, Robbins, Spencer, Dorin, Rachel M
Format Patent
LanguageEnglish
Published 07.02.2023
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Summary:A mesoporous isoporous asymmetric material includes at least one diblock or multiblock copolymer, wherein the material has a transition layer having a thickness of at least 300 nm and a low macrovoid density, and the material has a sub-structure adjacent to said transition layer and said sub-structure comprises a high macrovoid density. A method for producing mesoporous isoporous asymmetric materials having macrovoids can include: dissolving at least one diblock or multiblock copolymer in a solution, the solution having one or more solvents and one or more nonsolvents, to form a polymer solution; dispensing the polymer solution onto a substrate or mold, or through a die or template; removing at least a portion of solvent and/or nonsolvent from the polymer solution to form a concentrated polymer solution; and exposing the concentrated polymer solution to a nonsolvent causing precipitation of at least a portion of the polymer from the concentrated polymer solution.
Bibliography:Application Number: US201916980021