Substrate support, lithographic apparatus and loading method

A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the supp...

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Main Authors De Groot, Antonius Franciscus Johannes, Onvlee, Johannes, Symens, Wim, Vles, David Ferdinand
Format Patent
LanguageEnglish
Published 17.01.2023
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Abstract A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.
AbstractList A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface.
Author De Groot, Antonius Franciscus Johannes
Symens, Wim
Onvlee, Johannes
Vles, David Ferdinand
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Snippet A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a...
SourceID epo
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SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title Substrate support, lithographic apparatus and loading method
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