Substrate support, lithographic apparatus and loading method
A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the supp...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
17.01.2023
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Subjects | |
Online Access | Get full text |
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Summary: | A substrate support for supporting a substrate. The substrate support comprises a main body, a clamping device and a dither device. The main body comprises a support surface for supporting the substrate. The clamping device is arranged to provide the clamping force to clamp the substrate on the support surface. The dither device is configured to dither the clamping force. The dither device may be configured to dither the clamping force while the substrate W is being loaded onto the support surface. |
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Bibliography: | Application Number: US201716092021 |