Superconductor structure with normal metal connection to a resistor and method of making the same
A method of forming a superconductor structure is disclosed. The method comprises forming a superconductor line in a first dielectric layer, forming a resistor with an end coupled to an end of the superconductor line, and forming a second dielectric layer overlying the resistor. The method further c...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
06.12.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A method of forming a superconductor structure is disclosed. The method comprises forming a superconductor line in a first dielectric layer, forming a resistor with an end coupled to an end of the superconductor line, and forming a second dielectric layer overlying the resistor. The method further comprises etching a tapered opening through the second dielectric layer to the resistor, and performing a contact material fill with a normal metal material to fill the tapered opening and form a normal metal connector coupled to the resistor. |
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Bibliography: | Application Number: US202016738790 |