Superconductor structure with normal metal connection to a resistor and method of making the same

A method of forming a superconductor structure is disclosed. The method comprises forming a superconductor line in a first dielectric layer, forming a resistor with an end coupled to an end of the superconductor line, and forming a second dielectric layer overlying the resistor. The method further c...

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Bibliographic Details
Main Authors Graninger, Aurelius L, Rennie, Michael, Kirby, Christopher F, O'Donnell, Daniel J, Pesetski, Aaron A
Format Patent
LanguageEnglish
Published 06.12.2022
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Summary:A method of forming a superconductor structure is disclosed. The method comprises forming a superconductor line in a first dielectric layer, forming a resistor with an end coupled to an end of the superconductor line, and forming a second dielectric layer overlying the resistor. The method further comprises etching a tapered opening through the second dielectric layer to the resistor, and performing a contact material fill with a normal metal material to fill the tapered opening and form a normal metal connector coupled to the resistor.
Bibliography:Application Number: US202016738790