Semiconductor chamber components with high-performance coating
Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a showerhead. The chambers may include a substrate support. The substrate support may include a platen characterized by a first surface facing the showerhead. The substrate support may include a shaft co...
Saved in:
Main Author | |
---|---|
Format | Patent |
Language | English |
Published |
29.11.2022
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Exemplary semiconductor processing chambers may include a chamber body. The chambers may include a showerhead. The chambers may include a substrate support. The substrate support may include a platen characterized by a first surface facing the showerhead. The substrate support may include a shaft coupled with the platen along a second surface of the platen opposite the first surface of the platen. The shaft may extend at least partially through the chamber body. A coating may extend conformally about the first surface of the platen, the second surface of the platen, and about the shaft. |
---|---|
Bibliography: | Application Number: US202017080560 |