Multifunctional polymers
A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist...
Saved in:
| Main Authors | , , , , , , , , |
|---|---|
| Format | Patent |
| Language | English |
| Published |
15.11.2022
|
| Subjects | |
| Online Access | Get full text |
Cover
Loading…
| Abstract | A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers. |
|---|---|
| AbstractList | A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers. |
| Author | Sundberg, Linda K Sanchez, Martha I Sanders, Daniel P Watanabe, Satoshi Bozano, Luisa D Domon, Daisuke Sooriyakumaran, Ratnam Kawai, Yoshio Masunaga, Keiichi |
| Author_xml | – fullname: Domon, Daisuke – fullname: Masunaga, Keiichi – fullname: Sanders, Daniel P – fullname: Sundberg, Linda K – fullname: Sooriyakumaran, Ratnam – fullname: Bozano, Luisa D – fullname: Kawai, Yoshio – fullname: Watanabe, Satoshi – fullname: Sanchez, Martha I |
| BookMark | eNrjYmDJy89L5WSQ8C3NKclMK81LLsnMz0vMUSjIz6nMTS0q5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8aHBhoamBgZGFqZORsbEqAEAAMEktg |
| ContentType | Patent |
| DBID | EVB |
| DatabaseName | esp@cenet |
| DatabaseTitleList | |
| Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
| DeliveryMethod | fulltext_linktorsrc |
| Discipline | Medicine Chemistry Sciences Physics |
| ExternalDocumentID | US11500285B2 |
| GroupedDBID | EVB |
| ID | FETCH-epo_espacenet_US11500285B23 |
| IEDL.DBID | EVB |
| IngestDate | Fri Jul 19 15:01:00 EDT 2024 |
| IsOpenAccess | true |
| IsPeerReviewed | false |
| IsScholarly | false |
| Language | English |
| LinkModel | DirectLink |
| MergedId | FETCHMERGED-epo_espacenet_US11500285B23 |
| Notes | Application Number: US201816158103 |
| OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221115&DB=EPODOC&CC=US&NR=11500285B2 |
| ParticipantIDs | epo_espacenet_US11500285B2 |
| PublicationCentury | 2000 |
| PublicationDate | 20221115 |
| PublicationDateYYYYMMDD | 2022-11-15 |
| PublicationDate_xml | – month: 11 year: 2022 text: 20221115 day: 15 |
| PublicationDecade | 2020 |
| PublicationYear | 2022 |
| RelatedCompanies | International Business Machines Corporation Shin-Etsu Chemical Co., Ltd |
| RelatedCompanies_xml | – name: Shin-Etsu Chemical Co., Ltd – name: International Business Machines Corporation |
| Score | 3.439965 |
| Snippet | A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a... |
| SourceID | epo |
| SourceType | Open Access Repository |
| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| Title | Multifunctional polymers |
| URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221115&DB=EPODOC&locale=&CC=US&NR=11500285B2 |
| hasFullText | 1 |
| inHoldings | 1 |
| isFullTextHit | |
| isPrint | |
| link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQSbIwMEk2NEjTTUoyNNU1STW01LVItAQ25FIMUxONzCyTjc1Bu5F9_cw8Qk28IkwjmBiyYHthwOeEloMPRwTmqGRgfi8Bl9cFiEEsF_DaymL9pEygUL69W4itixq0d2wE7M4Ymqq5ONm6Bvi7-DurOTvbhgar-QXZgho-wKrU1AlYXLOCmtGgc_Zdw5xAu1IKkKsUN0EGtgCgaXklQgxMqXnCDJzOsJvXhBk4fKET3sIM7OAVmsnFQEFoLiwWYZAA75oF1UiQgTyFgvycStD4syiDoptriLOHLtCyeLjP4kODEe4yFmNgAfb4UyUYFJKBYWSSmmJikgbElimmlokWBpbmKebAzqSlRaJhiiSDFG5zpPBJSjNwgUIJtJnO0FSGgaWkqDRVFlirliTJgYMDAHGDerY |
| link.rule.ids | 230,309,786,891,25594,76904 |
| linkProvider | European Patent Office |
| linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQSbIwMEk2NEjTTUoyNNU1STW01LVItAQ25FIMUxONzCyTjc1Bu5F9_cw8Qk28IkwjmBiyYHthwOeEloMPRwTmqGRgfi8Bl9cFiEEsF_DaymL9pEygUL69W4itixq0d2wE7M4Ymqq5ONm6Bvi7-DurOTvbhgar-QXZgho-wKrU1AlYXLOaA7uEoHP2XcOcQLtSCpCrFDdBBrYAoGl5JUIMTKl5wgyczrCb14QZOHyhE97CDOzgFZrJxUBBaC4sFmGQAO-aBdVIkIE8hYL8nErQ-LMog6Kba4izhy7Qsni4z-JDgxHuMhZjYAH2-FMlGBSSgWFkkppiYpIGxJYpppaJFgaW5inmwM6kpUWiYYokgxRuc6TwScozcHqE-PrE-3j6eUszcIFCDLSxztBUhoGlpKg0VRZYw5YkyYGDBgBUe32h |
| openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Multifunctional+polymers&rft.inventor=Domon%2C+Daisuke&rft.inventor=Masunaga%2C+Keiichi&rft.inventor=Sanders%2C+Daniel+P&rft.inventor=Sundberg%2C+Linda+K&rft.inventor=Sooriyakumaran%2C+Ratnam&rft.inventor=Bozano%2C+Luisa+D&rft.inventor=Kawai%2C+Yoshio&rft.inventor=Watanabe%2C+Satoshi&rft.inventor=Sanchez%2C+Martha+I&rft.date=2022-11-15&rft.externalDBID=B2&rft.externalDocID=US11500285B2 |