Monomers, polymers and photoresist compositions
In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I):Photoresists that comprises such polymers also are provided.
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| Main Authors | , , , , , , |
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| Format | Patent |
| Language | English |
| Published |
25.10.2022
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| Subjects | |
| Online Access | Get full text |
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| Abstract | In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I):Photoresists that comprises such polymers also are provided. |
|---|---|
| AbstractList | In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I):Photoresists that comprises such polymers also are provided. |
| Author | Kim, Myung-Yeol Jang, Min Kyung Kim, Jung Woo Lee, Woo-Hyung Ryu, Eui Hyun Choi, Kwang-Mo Jeon, Hyun |
| Author_xml | – fullname: Kim, Jung Woo – fullname: Lee, Woo-Hyung – fullname: Jeon, Hyun – fullname: Choi, Kwang-Mo – fullname: Kim, Myung-Yeol – fullname: Ryu, Eui Hyun – fullname: Jang, Min Kyung |
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| Notes | Application Number: US201615253845 |
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| RelatedCompanies | Rohm and Haas Electronic Materials Korea Ltd |
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| Snippet | In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I):Photoresists that comprises such polymers also are... |
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| SubjectTerms | ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| Title | Monomers, polymers and photoresist compositions |
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