Monomers, polymers and photoresist compositions

In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I):Photoresists that comprises such polymers also are provided.

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Bibliographic Details
Main Authors Kim, Jung Woo, Lee, Woo-Hyung, Jeon, Hyun, Choi, Kwang-Mo, Kim, Myung-Yeol, Ryu, Eui Hyun, Jang, Min Kyung
Format Patent
LanguageEnglish
Published 25.10.2022
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:In one preferred embodiment, polymers are provided that comprise a structure of the following Formula (I):Photoresists that comprises such polymers also are provided.
Bibliography:Application Number: US201615253845