Phase change memory cell with a projection liner

A semiconductor structure may include a heater surrounded by a second dielectric layer, a projection liner on top of the second dielectric layer, and a phase change material layer above the projection liner. A top surface of the projection liner may be substantially flush with a top surface of the h...

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Bibliographic Details
Main Authors Simon, Andrew Herbert, Brew, Kevin W, Bhosale, Prasad, Ok, Injo, Saraf, Iqbal Rashid, Saulnier, Nicole, Bao, Ruqiang
Format Patent
LanguageEnglish
Published 18.10.2022
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Summary:A semiconductor structure may include a heater surrounded by a second dielectric layer, a projection liner on top of the second dielectric layer, and a phase change material layer above the projection liner. A top surface of the projection liner may be substantially flush with a top surface of the heater. The projection liner may separate the phase change material layer from the second dielectric layer. The projection liner may provide a parallel conduction path in the crystalline phase and the amorphous phase of the phase change material layer. The semiconductor structure may include a bottom electrode below and in electrical contact with the heater and a top electrode above and in electrical contact with the phase change material layer.
Bibliography:Application Number: US202017114605