Semiconductor processing apparatus and a method for processing a substrate
A semiconductor processing apparatus is disclosed. The apparatus may include, a reaction chamber and a susceptor dispose in the reaction chamber configured for supporting a substrate thereon, the susceptor comprising a plurality of through-holes in an axial direction of the susceptor. The apparatus...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
18.10.2022
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A semiconductor processing apparatus is disclosed. The apparatus may include, a reaction chamber and a susceptor dispose in the reaction chamber configured for supporting a substrate thereon, the susceptor comprising a plurality of through-holes in an axial direction of the susceptor. The apparatus may also include, a plurality of lift pins, each of the lift pins being disposed within a respective through-hole, and at least one gas transmitting channel comprising one or more gas channel outlets, the one or more gas channel outlets being disposed proximate to the through-holes. Methods for processing a substrate within a reaction chamber are also disclosed. |
---|---|
Bibliography: | Application Number: US201815909705 |