Kit, particle mixture, paste and methods

A particle mixture comprising particles of a first glass frit and particles of a second glass frit; wherein the first glass frit comprises ≥10 to ≤25 mol. % BaO; and ≥0 to ≤10 mol. % Bi2O3; and wherein the second glass frit comprises: ≥35 to ≤55 mol. % Bi2O3; ≥2 to ≤20 mol. % ZnO; and ≥10 to ≤40 mol...

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Bibliographic Details
Main Authors Currie, Edwin Peter Kennedy, Ren, Hong, Emelianova, Svetlana Nikolaevna
Format Patent
LanguageEnglish
Published 06.09.2022
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Summary:A particle mixture comprising particles of a first glass frit and particles of a second glass frit; wherein the first glass frit comprises ≥10 to ≤25 mol. % BaO; and ≥0 to ≤10 mol. % Bi2O3; and wherein the second glass frit comprises: ≥35 to ≤55 mol. % Bi2O3; ≥2 to ≤20 mol. % ZnO; and ≥10 to ≤40 mol. % B2O3.
Bibliography:Application Number: US201917047301