Random copolymer for forming neutral layer, laminate for forming pattern including the same, and method for forming pattern using the same
The present invention provides a random copolymer including structural units represented by the following Chemical Formulae 1 to 3for forming a neutral layer for significantly reducing process time and process costs, and promoting directed self-assembly pattern formation of a block copolymer. The pr...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
26.07.2022
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention provides a random copolymer including structural units represented by the following Chemical Formulae 1 to 3for forming a neutral layer for significantly reducing process time and process costs, and promoting directed self-assembly pattern formation of a block copolymer. The present invention further provides a laminate for forming a pattern including a neutral layer having a small thickness variation value due to washing, by including the random copolymer for forming a neutral layer. The present invention further provides a method for forming a pattern capable of stably vertically orienting a block copolymer on a laminate for forming a neutralized pattern. |
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Bibliography: | Application Number: US202017034196 |