Thermal substrate with high-resistance magnification and positive temperature coefficient ink

An article comprising a heater that comprises a high-resistance magnification (HRM) PTC ink deposited on a flexible substrate to form one or more resistors. The HRM PTC ink has a resistance magnification of at least 20 in a temperature range of at least 20 degrees Celsius above a switching temperatu...

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Bibliographic Details
Main Authors Xiao, Shuyong, Abbott, Richard C
Format Patent
LanguageEnglish
Published 17.05.2022
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Summary:An article comprising a heater that comprises a high-resistance magnification (HRM) PTC ink deposited on a flexible substrate to form one or more resistors. The HRM PTC ink has a resistance magnification of at least 20 in a temperature range of at least 20 degrees Celsius above a switching temperature of the ink, the resistance magnification being defined as a ratio between a resistance of the double-resin ink at a temperature 'T' and a resistance of the double-resin ink at 25 degrees Celsius.
Bibliography:Application Number: US202117147901