Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that...

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Bibliographic Details
Main Authors Kunnen, Johan Gertrudis Cornelis, Jacobs, Johannes Henricus Wilhelmus, Verspaget, Coen Cornelis Wilhelmus, Bloks, Ruud Hendrikus Martinus Johannes, Laurent, Thibault Simon Mathieu, Houben, Martijn, Thomas, Ivo Adam Johannes, Van Der Ham, Ronald, Remie, Marinus Jan, Corcoran, Gregory Martin Mason, Pieterse, Gerben, Gunter, Pieter Lein Joseph, Derks, Sander Catharina Reinier
Format Patent
LanguageEnglish
Published 12.04.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
Bibliography:Application Number: US201916722924