Lithographic apparatus and method
A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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Main Authors | , , , , , , , , |
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Format | Patent |
Language | English |
Published |
22.03.2022
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Subjects | |
Online Access | Get full text |
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Abstract | A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. |
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AbstractList | A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. |
Author | Ten Kate, Nicolaas Remie, Marinus Jan Voogd, Robbert Jan Ottens, Joost Jeroen Jacobs, Johannes Henricus Wilhelmus Nino, Giovanni Francisco Laurent, Thibault Simon Mathieu Knarren, Bastiaan Andreas Wilhelmus Hubertus Kunnen, Johan Gertrudis Cornelis |
Author_xml | – fullname: Laurent, Thibault Simon Mathieu – fullname: Kunnen, Johan Gertrudis Cornelis – fullname: Ottens, Joost Jeroen – fullname: Jacobs, Johannes Henricus Wilhelmus – fullname: Knarren, Bastiaan Andreas Wilhelmus Hubertus – fullname: Remie, Marinus Jan – fullname: Voogd, Robbert Jan – fullname: Nino, Giovanni Francisco – fullname: Ten Kate, Nicolaas |
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Snippet | A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
Title | Lithographic apparatus and method |
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