Lithographic apparatus and method
A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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Main Authors | , , , , , , , , |
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Format | Patent |
Language | English |
Published |
22.03.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. |
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Bibliography: | Application Number: US202016734579 |