Pattern part, method for forming pattern part and method for manufacturing display device using same

A method of forming a pattern part includes forming a first film on a target object, the first film having a first cure shrinkage ratio, forming a second film on the first film, the second film having a second cure shrinkage ratio greater than the first cure shrinkage ratio, and patterning the first...

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Bibliographic Details
Main Authors Oh, Seyoon, Ko, Seungcheol, Sim, Junho
Format Patent
LanguageEnglish
Published 15.03.2022
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Summary:A method of forming a pattern part includes forming a first film on a target object, the first film having a first cure shrinkage ratio, forming a second film on the first film, the second film having a second cure shrinkage ratio greater than the first cure shrinkage ratio, and patterning the first film and the second film to form a pattern.
Bibliography:Application Number: US201916662712