Lithographic apparatus and a device manufacturing method

A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder c...

Full description

Saved in:
Bibliographic Details
Main Authors Soethoudt, Abraham Alexander, Stevens, Lucas Henricus Johannes, Harberts, Dirk Willem, Fernandez Diaz, Laura Maria, Poiesz, Thomas, Welters, Wilhelmus Jacobus Johannes, Scholten, Bert Dirk, Pijnenburg, Johannes Adrianus Cornelis Maria, Van De Winkel, Jimmy Matheus Wilhelmus
Format Patent
LanguageEnglish
Published 08.03.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
Bibliography:Application Number: US202016952371