Cell row arrangement in regions of integrated circuit layout
A method of generating a layout design of an integrated circuit. The method includes forming a first region having at least two first-type cell rows extending in a first direction. Each one of the first-type cell rows has a first row height measured along a second direction perpendicular to the firs...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
22.02.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A method of generating a layout design of an integrated circuit. The method includes forming a first region having at least two first-type cell rows extending in a first direction. Each one of the first-type cell rows has a first row height measured along a second direction perpendicular to the first direction. The method also includes forming a second region having at least two second-type cell rows extending in the first direction. Each one of the second-type cell rows has a second row height measured along the second direction. The first region is adjacent to the second region, and the first row height of the first-type cell rows is different from the second row height of the second-type cell rows. |
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Bibliography: | Application Number: US202017025296 |