High voltage blocking III-V semiconductor device
A semiconductor device includes type IV semiconductor base substrate, first and second device areas that are electrically isolated from one another, a first region of type III-V semiconductor material formed over the first device area, a second region of type III-V semiconductor material formed over...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
15.02.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor device includes type IV semiconductor base substrate, first and second device areas that are electrically isolated from one another, a first region of type III-V semiconductor material formed over the first device area, a second region of type III-V semiconductor material formed over the second device area, the second region of type III-V semiconductor material being laterally electrically insulated from the first region of type III-V semiconductor material, a first high-electron mobility transistor integrally formed in the first region, and a second high-electron mobility transistor integrally formed in the second region. The first and second high-electron mobility transistors are connected in series. A source terminal of the first high-electron mobility transistor is electrically connected to the first device area. The first device area is electrically isolated from a subjacent intrinsically doped region of the base substrate by a first two-way voltage blocking device. |
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Bibliography: | Application Number: US202016828104 |