Semiconductor devices

A semiconductor device including an active region extending in a first direction on a substrate; a gate structure intersecting the active region and extending in a second direction on the substrate; and a source/drain region on the active region and at least one side of the gate structure, wherein t...

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Bibliographic Details
Main Authors Jang, Sung Uk, Jung, Su Jin, Kim, Bong Soo, Cho, Young Dae, Kim, Ki Hwan
Format Patent
LanguageEnglish
Published 01.02.2022
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Summary:A semiconductor device including an active region extending in a first direction on a substrate; a gate structure intersecting the active region and extending in a second direction on the substrate; and a source/drain region on the active region and at least one side of the gate structure, wherein the source/drain region includes a plurality of first epitaxial layers spaced apart from each other in the first direction, the plurality of first epitaxial layers including first impurities of a first conductivity type; and a second epitaxial layer filling a space between the plurality of first epitaxial layers, the second epitaxial layer including second impurities of the first conductivity type.
Bibliography:Application Number: US201916598012