Compositions comprising alcohol-rich mixtures of alcohol and propylene glycol methyl ethers

A composition for removing nail polish includes a propylene glycol methyl ether; and a C2-C3 monoalcohol. The C2-C3 monoalcohol and the propylene glycol methyl ether are present in a C2-C3 monoalcohol to propylene glycol methyl ether ratio by weight from about 1:1 to about 20:1. Methods for removing...

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Bibliographic Details
Main Authors Pang, Christopher, Huang, Tsang-Min, Hsieh, I-Fan
Format Patent
LanguageEnglish
Published 11.01.2022
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
FATTY ACIDS THEREFROM
HUMAN NECESSITIES
HYGIENE
MEDICAL OR VETERINARY SCIENCE
METALLURGY
PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES
RECOVERY OF GLYCEROL
RESIN SOAPS
SOAP OR SOAP-MAKING
SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Summary:A composition for removing nail polish includes a propylene glycol methyl ether; and a C2-C3 monoalcohol. The C2-C3 monoalcohol and the propylene glycol methyl ether are present in a C2-C3 monoalcohol to propylene glycol methyl ether ratio by weight from about 1:1 to about 20:1. Methods for removing nail polish are also provided.
Bibliography:Application Number: US201916426105