Substrate support, lithographic apparatus, substrate inspection apparatus, device manufacturing method

The invention provides a substrate support for supporting a substrate, comprising:a support body, which support body comprises a support surface for supporting the substrate,a rotary dither device, which is configured to induce a relative rotary dither motion between the substrate and the support su...

Full description

Saved in:
Bibliographic Details
Main Authors Meulendijks, Luc Leonardus Adrianus Martinus, De Groot, Antonius Franciscus Johannes, Vermeulen, Johannes Petrus Martinus Bernardus, Pijnenburg, Johannes Adrianus Cornelis Maria
Format Patent
LanguageEnglish
Published 26.10.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:The invention provides a substrate support for supporting a substrate, comprising:a support body, which support body comprises a support surface for supporting the substrate,a rotary dither device, which is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis which is perpendicular to the support surface.
Bibliography:Application Number: US201917269909