Integrated circuit with vertically structured capacitive element, and its fabricating process

A capacitive element includes a trench extending vertically into a well from a first side. The trench is filled with a conductive central section clad with an insulating cladding. The capacitive element further includes a first conductive layer covering a first insulating layer that is located on th...

Full description

Saved in:
Bibliographic Details
Main Authors Cabout, Thomas, Hubert, Quentin, Regnier, Arnaud, Marzaki, Abderrezak, Niel, Stephan
Format Patent
LanguageEnglish
Published 05.10.2021
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A capacitive element includes a trench extending vertically into a well from a first side. The trench is filled with a conductive central section clad with an insulating cladding. The capacitive element further includes a first conductive layer covering a first insulating layer that is located on the first side and a second conductive layer covering a second insulating layer that is located on the first conductive layer. The conductive central section and the first conductive layer are electrically connected to form a first electrode of the capacitive element. The second conductive layer and the well are electrically connected to form a second electrode of the capacitive element. The insulating cladding, the first insulating layer and the second insulating layer form a dielectric region of the capacitive element.
Bibliography:Application Number: US202017026869