Integrated circuit devices including vertical field-effect transistors (VFETs)

Integrated circuit devices including standard cells are provided. The standard cells may include a P-type vertical field effect transistor (VFET) including a first channel region and a first top source/drain region sequentially stacked on a substrate in a vertical direction, an N-type VFET including...

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Bibliographic Details
Main Author Do, Jung Ho
Format Patent
LanguageEnglish
Published 28.09.2021
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Summary:Integrated circuit devices including standard cells are provided. The standard cells may include a P-type vertical field effect transistor (VFET) including a first channel region and a first top source/drain region sequentially stacked on a substrate in a vertical direction, an N-type VFET including a second channel region and a second top source/drain region sequentially stacked on the substrate in the vertical direction, and a top contact layer contacting both the first top source/drain region and the second top source/drain region.
Bibliography:Application Number: US201916540090