Heat-light separation for a UV radiation source

A device for applying UV radiation to substrates in a field of application. The device includes: a radiation source, which emits both UV radiation and visible light and infrared radiation in a spatial angle; and a radiation-selective deflecting mirror, which mostly reflects the UV radiation and most...

Full description

Saved in:
Bibliographic Details
Main Author Zuger, Othmar
Format Patent
LanguageEnglish
Published 06.07.2021
Subjects
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
BLASTING
DRYING
DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
HEATING
LIGHTING
MECHANICAL ENGINEERING
PERFORMING OPERATIONS
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
WEAPONS
Online AccessGet full text

Cover

More Information
Summary:A device for applying UV radiation to substrates in a field of application. The device includes: a radiation source, which emits both UV radiation and visible light and infrared radiation in a spatial angle; and a radiation-selective deflecting mirror, which mostly reflects the UV radiation and mostly transmits the VIS and IR radiation. The deflecting mirror includes at least two flat mirror strips, which are tilted with respect to each other.
Bibliography:Application Number: US201414902052