Fluid handling structure for lithographic apparatus
A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and sec...
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Main Authors | , , , , , , , , , , , , , |
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Format | Patent |
Language | English |
Published |
08.06.2021
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Subjects | |
Online Access | Get full text |
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